The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2015

Filed:

Oct. 15, 2013
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Hans-Joachim Schulze, Taufkirchen, DE;

Franz-Josef Niedernostheide, Muenster, DE;

Yvonne Gawlina, Pullach im Isartal, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/739 (2006.01); H01L 29/36 (2006.01); H01L 29/74 (2006.01); H01L 29/78 (2006.01); H01L 29/861 (2006.01); H01L 21/263 (2006.01); H01L 21/265 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7393 (2013.01); H01L 29/66 (2013.01); H01L 29/36 (2013.01); H01L 29/66333 (2013.01); H01L 29/74 (2013.01); H01L 29/78 (2013.01); H01L 29/861 (2013.01); H01L 21/263 (2013.01); H01L 21/26506 (2013.01);
Abstract

A semiconductor device includes a semiconductor body including a first surface having a normal direction defining a vertical direction, a first n-type semiconductor region arranged below the first surface and having a first maximum doping concentration and a second n-type semiconductor region arranged below the first n-type semiconductor region and including, in a vertical cross-section, two spaced apart first n-type portions each adjoining the first n-type semiconductor region, having a maximum doping concentration which is higher than the first maximum doping concentration and having a first minimum distance to the first surface, and a second n-type portion adjoining the first n-type semiconductor region, having a maximum doping concentration which is higher than the first maximum doping concentration and a second minimum distance to the first surface which is larger than the first minimum distance. A p-type second semiconductor layer forms a pn-junction with the second n-type portion.


Find Patent Forward Citations

Schulze, Hans-Joachim. (2015). Semiconductor device with laterally varying doping concentrations (U.S. Patent No. 9054151). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9054151

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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