The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2015
Filed:
Mar. 06, 2014
Applicant:
Inotera Memories, Inc., Taoyuan County, TW;
Inventors:
Eric Lahaug, Bristow, VA (US);
Chia-Ming Yang, Kaohsiung, TW;
Regan Stanley Tsui, Falls Church, VA (US);
Assignee:
Inotera Memories, Inc., Taoyuan County, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01); H01L 29/00 (2006.01); H01L 29/06 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02271 (2013.01);
Abstract
The present disclosure provides a wafer that can be used in coating films. The wafer includes a front surface, a back surface opposite to the front surface, and a plurality of trenches. The back surface further includes a central region and a surrounding region. The trenches are disposed on the back surface. The spacing between any two adjacent trenches in surrounding region is less than the spacing between any two adjacent trenches in the central region.