The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2015

Filed:

Oct. 14, 2012
Applicant:

Headway Technologies, Inc., Milpitas, CA (US);

Inventors:

Shengyuan Wang, San Jose, CA (US);

Kunliang Zhang, Fremont, CA (US);

Min Li, Fremont, CA (US);

Assignee:

Headway Technologies, Inc., Milpitas, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/127 (2006.01); G11B 5/31 (2006.01); C23C 14/02 (2006.01); C23C 14/16 (2006.01);
U.S. Cl.
CPC ...
G11B 5/1278 (2013.01); Y10T 428/1171 (2015.01); G11B 5/3116 (2013.01); G11B 5/3163 (2013.01); C23C 14/024 (2013.01); C23C 14/16 (2013.01);
Abstract

A sub-structure, suitable for use as a hot seed on which to form a perpendicular magnetic main write pole, is described. It is made up of a buffer layer of atomic layer deposited alumina on which there are one or more seed layers having a body-centered cubic (bcc) crystal structure. Finally, the high coercivity magnetic film lies on the seed layer(s). It is critical that the high coercivity magnetic film be deposited at a very low deposition rate (around 1 Angstrom per second).


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