The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2015

Filed:

Mar. 18, 2014
Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Tsuyoshi Nakamura, Kawasaki, JP;

Kazuishi Tanno, Kawasaki, JP;

Akiya Kawaue, Kawasaki, JP;

Takayoshi Mori, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C08F 28/00 (2006.01); G03F 7/038 (2006.01); C08F 220/24 (2006.01); C08F 220/56 (2006.01); C08F 20/52 (2006.01); C07C 381/12 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C08F 220/24 (2013.01); C08F 220/56 (2013.01); C08F 20/52 (2013.01); C07C 381/12 (2013.01);
Abstract

A resist composition contains a high-molecular weight compound which has a partial structure represented by a general formula (a0-r-1) and has a constituent unit represented by a general formula (a0-1). In the formula (a0-r-1), Yrepresents a divalent linking group; each of Rand Rrepresents a group having 0 to 20 carbon atoms, which is not a fluorine atom, and either Ror Rmay form a ring with Y; m represents an integer of 1 or more; and Mrepresents an m-valent organic cation. In the formula (a0-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Yarepresents a single bond or a divalent linking group; Xrepresents a sulfur atom or an oxygen atom; and Rarepresents an optionally substituted cyclic group, chain alkyl group or chain alkenyl group.


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