The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2015
Filed:
Oct. 05, 2010
Applicants:
Xavier Baillin, Crolles, FR;
Emmanuelle Lagoutte, St Marcellin, FR;
Guillaume Rodriguez, Le Champ Pres Froges, FR;
Inventors:
Xavier Baillin, Crolles, FR;
Emmanuelle Lagoutte, St Marcellin, FR;
Guillaume Rodriguez, Le Champ Pres Froges, FR;
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
H05K 5/00 (2006.01); B05D 5/12 (2006.01); B81C 1/00 (2006.01); H01J 29/94 (2006.01); H01L 23/10 (2006.01); H01L 23/26 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00285 (2013.01); H01J 29/94 (2013.01); H01J 2211/52 (2013.01); H01L 23/10 (2013.01); H01L 23/26 (2013.01); H01L 2924/0002 (2013.01);
Abstract
A treatment method for a getter material is provided, including forming a protective layer on the thin layer getter material by performing at least one oxidation and/or nitriding step of the thin layer getter material conducted under dry atmosphere of dioxygen and/or dinitrogen, wherein the protective layer is composed of oxide and/or nitride of the thin layer getter material, and wherein a thickness of the protective layer is between approximately 1 nm and 10 nm.