The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Jul. 08, 2009
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same
Takayuki Kato, Haibara-gun, JP;
Michihiro Shirakawa, Haibara-gun, JP;
Hyou Takahashi, Haibara-gun, JP;
Takayuki Kato, Haibara-gun, JP;
Michihiro Shirakawa, Haibara-gun, JP;
Hyou Takahashi, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin that exhibits an increased solubility in an alkali developer when acted on by an acid, and (B) at least two types of sulfonic acid generators that generate a sulfonic acid when exposed to actinic rays or radiation, wherein the two types of sulfonic acid generators (B) consist of sulfonic acid generators (B1) and (B2) satisfying the following requirements, namely the sulfonic acid generator (B1) generates a sulfonic acid composed of 9 to 20 elements with an acid strength (pKa) satisfying the relationship pKa<−3.50, and the sulfonic acid generator (B2) generates an acid composed of 17 or more elements with an acid strength (pKa) satisfying the relationship −2.00>pKa≧−3.50, provided that no hydrogen atom is included in the number of elements of the generated acids.