The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2015

Filed:

Aug. 27, 2013
Applicant:

Samsung Electro-mechanics Co., Ltd., Suwon, KR;

Inventors:

Chang Bo Lee, Suwon, KR;

Chang Sup Ryu, Suwon, KR;

Hyo Bin Park, Yeongi-gun, KR;

Cheol Ho Choi, Suwon, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K 1/03 (2006.01); H05K 1/00 (2006.01); H05K 7/10 (2006.01); H05K 1/02 (2006.01); H05K 3/00 (2006.01); H01L 23/498 (2006.01); H01L 21/48 (2006.01); H05K 3/34 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
H05K 1/0296 (2013.01); H05K 3/0023 (2013.01); H05K 3/3452 (2013.01); H05K 2203/058 (2013.01); H05K 2203/0597 (2013.01); H05K 2203/1173 (2013.01); H01L 24/16 (2013.01); H01L 2224/16225 (2013.01); H01L 23/498 (2013.01); H01L 21/4846 (2013.01);
Abstract

The present invention relates to a method for forming solder resist and a substrate for a package. The method for forming solder resist including: forming a first solder resist inner region by primarily coating, exposing, and developing a solder resist on a substrate on which an outer PoP pad and an inner chip pad are formed, and removing the solder resist's outer portion on the substrate's outer region and curing the solder resist's inner portion on the substrate's inner region; forming a plugged SR region which does not expose the substrate; changing a surface roughness by performing a desmear process on a surface of the first solder resist inner region in which the plugged SR region is formed; and forming a second solder resist SMD region which covers an edge of the PoP pad, exposing, and developing the solder resist on the substrate after the desmear process is provided.


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