The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2015

Filed:

May. 23, 2012
Applicants:

Selvaraj Palanisamy Chinnathambi, Jurong, SG;

Haresh Siriwardane, Woodlands, SG;

Inventors:
Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C09K 3/14 (2006.01); H01L 21/321 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
C09K 3/1463 (2013.01); H01L 21/3212 (2013.01); H01L 21/30625 (2013.01); B81C 2201/0104 (2013.01);
Abstract

The invention provides a chemical-mechanical polishing composition containing wet-process silica, an oxidizing agent that oxidizes nickel-phosphorous, a chelating agent, polyvinyl alcohol, and water. The invention also provides a method of chemically-mechanically polishing a substrate, especially a nickel-phosphorous substrate, by contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, moving the polishing pad and the polishing composition relative to the substrate, and abrading at least a portion of the substrate to polish the substrate.


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