The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2015
Filed:
Jun. 09, 2009
Applicants:
Felix Horstmann, Braunschweig, DE;
Volker Sittinger, Braunschweig, DE;
Bernd Szyszka, Braunschweig, DE;
Inventors:
Felix Horstmann, Braunschweig, DE;
Volker Sittinger, Braunschweig, DE;
Bernd Szyszka, Braunschweig, DE;
Assignee:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/58 (2006.01); C23C 14/08 (2006.01); C23C 14/35 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/5806 (2013.01); C23C 14/3492 (2013.01); C23C 14/086 (2013.01); C23C 14/3485 (2013.01); C23C 14/35 (2013.01); H01J 37/3467 (2013.01);
Abstract
A method for producing a transparent and conductive metal oxide layer on a substrate, includes atomizing at least one component of the metal oxide layer by highly ionized, high power pulsed magnetron sputtering to condense on the substrate. The pulses of the magnetron have a peak power density of more than 1.5 kW/cm, the pulses of the magnetron have a duration of ≦200 μs, and the average increase in current density during ignition of the plasma within an interval, which is ≦0.025 ms, is at least 106 A/(ms cm).