The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2015
Filed:
Jan. 27, 2010
Ken Yoshioka, Hikari, JP;
Motohiko Yoshigai, Hikari, JP;
Ryoji Nishio, Kudamatsu, JP;
Tadayoshi Kawaguchi, Kudamatsu, JP;
Ken Yoshioka, Hikari, JP;
Motohiko Yoshigai, Hikari, JP;
Ryoji Nishio, Kudamatsu, JP;
Tadayoshi Kawaguchi, Kudamatsu, JP;
HITACHI HIGH-TECHNOLOGIES CORPORATION, Tokyo, JP;
Abstract
The invention provides a plasma processing apparatus in which ring-like conductorsandare arranged closed to and along an induction antennacomposed of an inner circumference coiland an outer circumference coil. Ring-like conductorsandare each characterized in that the radius from the center of the apparatus and the cross-sectional shape of the conductor body varies along the circumferential angle of the coils. Since the mutual inductances between the ring-like conductorsandand the induction antennaand between the ring-like conductorsandand the plasma along the circumferential position are controlled, it becomes possible to compensate for the coil currents varied along the circumference of the coils of the induction antenna, and to improve the non-uniformity in the circumferential direction of the current in the generated plasma.