The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2015
Filed:
Apr. 08, 2010
Applicant:
Aurelian Dodoc, Heidenheim, DE;
Inventor:
Aurelian Dodoc, Heidenheim, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/10 (2006.01); G02B 17/06 (2006.01); G02B 5/08 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G02B 17/0657 (2013.01); G02B 5/0891 (2013.01); G03F 7/70316 (2013.01); G03F 7/70958 (2013.01);
Abstract
A mirror for the EUV wavelength range () having a layer arrangement (P) applied on a substrate (S), the layer arrangement having a periodic sequence of individual layers, where the periodic sequence has at least two individual layers—forming a period—composed respectively of silicon (Si) and ruthenium (Ru). Also disclosed are a projection objective for microlithography () including such a mirror, and a projection exposure apparatus for microlithography having such a projection objective ().