The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2015
Filed:
Nov. 10, 2011
Applicants:
Krzysztof Nowak, Oyama, JP;
Takashi Suganuma, Oyama, JP;
Osamu Wakabayashi, Hiratsuka, JP;
Inventors:
Assignee:
GIGAPHOTON INC., Tochigi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 4/00 (2006.01); H01S 3/10 (2006.01); H01S 3/23 (2006.01); H05G 2/00 (2006.01); H01S 3/00 (2006.01); H01S 3/03 (2006.01);
U.S. Cl.
CPC ...
H01S 3/2366 (2013.01); H05G 2/008 (2013.01); H01S 3/2375 (2013.01); H01S 3/005 (2013.01); H01S 3/0315 (2013.01);
Abstract
An EUV light generation system includes a driver laser comprising a master oscillator such as a semiconductor laser, a spatial filter, gas slab amplification devices, relay optical systems, and high-speed axial-flow amplifiers. The slab amplification devices include beam adjusting optical units disposed, respectively, at input and output sides of the slab amplifiers SA to convert the beam profile and/or polarization direction and/or an elongated direction of the beam profile with the slab amplifiers is parallel to a free space axis AF of the slab waveguides, i.e. parallel to the discharge electrodes.