The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2015
Filed:
Sep. 28, 2011
Applicants:
Shuhei Yamaguchi, Shizuoka, JP;
Akinori Shibuya, Shizuoka, JP;
Yusuke Iizuka, Shizuoka, JP;
Inventors:
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); C08F 12/20 (2006.01); C08F 12/22 (2006.01); C08F 12/26 (2006.01); C08F 12/30 (2006.01); C08F 212/12 (2006.01); G03F 7/11 (2006.01); C08F 212/14 (2006.01); C08F 220/42 (2006.01); C08F 220/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); G03F 7/0392 (2013.01); C08F 12/20 (2013.01); C08F 12/22 (2013.01); C08F 12/26 (2013.01); C08F 12/30 (2013.01); C08F 212/12 (2013.01); C08F 212/14 (2013.01); C08F 220/42 (2013.01); C08F 2220/281 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01); Y10S 430/108 (2013.01);
Abstract
Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin, wherein the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below.