The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2015

Filed:

Sep. 17, 2014
Applicant:

Intermolecular Inc., San Jose, CA (US);

Inventors:

Pragati Kumar, Beaverton, OR (US);

Sean Barstow, San Jose, CA (US);

Tony P. Chiang, Campbell, CA (US);

Sandra G Malhotra, Fort Collins, CO (US);

Assignee:

Intermolecular, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 11/00 (2006.01); H01L 45/00 (2006.01); G11C 13/00 (2006.01); H01L 27/24 (2006.01); H01L 29/861 (2006.01);
U.S. Cl.
CPC ...
H01L 45/1253 (2013.01); G11C 13/0007 (2013.01); G11C 13/003 (2013.01); G11C 2213/32 (2013.01); G11C 2213/51 (2013.01); G11C 2213/52 (2013.01); G11C 2213/56 (2013.01); G11C 2213/71 (2013.01); G11C 2213/72 (2013.01); G11C 2213/74 (2013.01); G11C 2213/76 (2013.01); G11C 2213/79 (2013.01); H01L 45/04 (2013.01); H01L 45/1233 (2013.01); H01L 45/146 (2013.01); H01L 45/1608 (2013.01); H01L 45/165 (2013.01); H01L 27/2409 (2013.01); H01L 27/2463 (2013.01); H01L 29/861 (2013.01); H01L 45/145 (2013.01);
Abstract

Nonvolatile memory elements including resistive switching metal oxides may be formed in one or more layers on an integrated circuit. Each memory element may have a first conductive layer, a metal oxide layer, and a second conductive layer. Electrical devices such as diodes may be coupled in series with the memory elements. The first conductive layer may be formed from a metal nitride. The metal oxide layer may contain the same metal as the first conductive layer. The metal oxide may form an ohmic contact or a Schottky contact with the first conductive layer. The second conductive layer may form an ohmic contact or Schottky contact with the metal oxide layer. The first conductive layer, the metal oxide layer, and the second conductive layer may include sublayers. The second conductive layer may include an adhesion or barrier layer and a workfunction control layer.


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