The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2015
Filed:
Dec. 02, 2012
K-space Associates, Inc., Dexter, MI (US);
Scott Hines, Ypsilanti, MI (US);
Darryl Barlett, Dexter, MI (US);
Charles A. Taylor, II, Ann Arbor, MI (US);
Greg DeMaggio, Ann Arbor, MI (US);
k-Space Associates, Inc., Dexter, MI (US);
Abstract
A method and apparatus for determining the synchronicity of a rotary platen () in a vacuum deposition chamber (). A light source () projects a highly collimated light beam () onto the rotating platen (), thereby tracing a circular swept path (). The swept path () passes alternately through samples () on the platen () and intervening webs (). The samples () are significantly more reflective than the webs (). The platen () includes an asymmetry feature () along the swept path (). A detector () measures light signals reflected from the platen () along the swept path (), and generates a unique signal upon encountering the asymmetry feature (). A microcontroller generates a trigger pulse synchronized to the unique signal.