The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2015
Filed:
Aug. 02, 2011
Applicants:
Benjamin Sigel, Aalen, DE;
Andreas Bertele, Steinheim, DE;
Peter Kloesch, Oberkochen, DE;
Martin Mahlmann, Lauchheim, DE;
Jochen Weber, Heidenheim-Grosskuchen, DE;
Inventors:
Benjamin Sigel, Aalen, DE;
Andreas Bertele, Steinheim, DE;
Peter Kloesch, Oberkochen, DE;
Martin Mahlmann, Lauchheim, DE;
Jochen Weber, Heidenheim-Grosskuchen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/52 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/709 (2013.01); G03F 7/70266 (2013.01); G03F 7/70825 (2013.01); G03F 7/70891 (2013.01);
Abstract
The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.