The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2015

Filed:

Sep. 12, 2013
Applicant:

Panasonic Corporation, Osaka, JP;

Inventors:

Nobuyuki Horikawa, Kyoto, JP;

Masao Uchida, Osaka, JP;

Masahiko Niwayama, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/15 (2006.01); H01L 29/06 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/16 (2006.01); H01L 21/82 (2006.01); H01L 27/06 (2006.01); H01L 29/45 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0696 (2013.01); H01L 29/7828 (2013.01); H01L 29/45 (2013.01); H01L 29/66068 (2013.01); H01L 29/1608 (2013.01); H01L 21/8213 (2013.01); H01L 27/0605 (2013.01); H01L 27/0629 (2013.01);
Abstract

A semiconductor device includes a first cell and a second cell. Each of the first cell and the second cell includes a first silicon carbide semiconductor layer including a first region and a second region provided in the first region, a second silicon carbide semiconductor layer provided on and in contact with the first silicon carbide semiconductor layer, a first ohmic electrode in ohmic contact with the second region, and an insulating film provided on the second silicon carbide semiconductor layer. The first cell includes a gate electrode, and the second cell includes no electrode configured to control the electric potential of the second silicon carbide semiconductor layer independently of the electric potential of the first ohmic electrode.


Find Patent Forward Citations

Loading…