The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2015

Filed:

Nov. 30, 2012
Applicants:

Digby Pun, San Jose, CA (US);

Ali Shajii, Weston, MA (US);

Andrew B. Cowe, Andover, MA (US);

Raymond Ellis, Aptos, CA (US);

James T. Mcwhirter, San Jose, CA (US);

Inventors:

Digby Pun, San Jose, CA (US);

Ali Shajii, Weston, MA (US);

Andrew B. Cowe, Andover, MA (US);

Raymond Ellis, Aptos, CA (US);

James T. McWhirter, San Jose, CA (US);

Assignee:

Ultratech, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/268 (2006.01); H01L 21/324 (2006.01); B23K 26/12 (2014.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
B23K 26/127 (2013.01); H01L 31/1864 (2013.01); H01L 31/18 (2013.01); B23K 26/12 (2013.01); H01L 21/268 (2013.01); H01L 21/324 (2013.01);
Abstract

A movable microchamber system with a gas curtain is disclosed. The microchamber system has a top member with a light-access feature and a stage assembly that supports a substrate to be processed. The stage assembly is disposed relative to the top member to define a microchamber and a peripheral microchamber gap. An inert gas is flowed into the peripheral microchamber gap to form the gas curtain just outside of the microchamber. The gas curtain substantially prevents reactive gas in the ambient environment from entering the microchamber when the stage assembly moves relative to the top member.


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