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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9023581 B1

PDFFull Text
Date of Patent:
May. 05, 2015

Filed:

Jun. 14, 2011

Resist composition, method of forming resist pattern, polymeric compound, and compound

Applicants:

Akiya Kawaue, Kawasaki, JP;

Kazushige Dohtani, Kawasaki, JP;

Yoshiyuki Utsumi, Kawasaki, JP;

Jun Iwashita, Kawasaki, JP;

Kenri Konno, Kawasaki, JP;

Daiju Shiono, Kawasaki, JP;

Daichi Takaki, Kawasaki, JP;

Inventors:

Akiya Kawaue, Kawasaki, JP;

Kazushige Dohtani, Kawasaki, JP;

Yoshiyuki Utsumi, Kawasaki, JP;

Jun Iwashita, Kawasaki, JP;

Kenri Konno, Kawasaki, JP;

Daiju Shiono, Kawasaki, JP;

Daichi Takaki, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd, Kawasaki-shi, JP;

Attorney:

Knobbe Martens Olsen & Bear LLP

Primary Examiner:

John Chu

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); C07C 69/54 (2006.01); C08F 220/38 (2006.01); G03F 7/027 (2006.01); C07C 309/04 (2006.01); C07C 309/09 (2006.01); C07C 309/10 (2006.01); C07C 309/12 (2006.01); C07C 311/48 (2006.01); C07C 311/51 (2006.01); C07C 381/12 (2006.01); C08F 20/38 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/027 (2013.01); C07C 69/54 (2013.01); C08F 2220/382 (2013.01); C07C 309/04 (2013.01); C07C 309/09 (2013.01); C07C 309/10 (2013.01); C07C 309/12 (2013.01); C07C 311/48 (2013.01); C07C 311/51 (2013.01); C07C 381/12 (2013.01); C07C 2101/14 (2013.01); C07C 2103/74 (2013.01); C08F 20/38 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); Y10S 430/111 (2013.01); Y10S 430/121 (2013.01);
Abstract

A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).

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