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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9023580 B1

PDFFull Text
Date of Patent:
May. 05, 2015

Filed:

Nov. 21, 2012

Method of forming polymeric compound, resist composition and method of forming resist pattern

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Daiju Shiono, Kawasaki, JP;

Tomoyuki Hirano, Kawasaki, JP;

Takahiro Dazai, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

Anca Eoff

Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08F 2/38 (2006.01); G03F 7/004 (2006.01); C08F 28/06 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); C08F 28/06 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01);
Abstract

A method of producing a polymeric compound, including: copolymerizing a monomer containing an —SO— containing cyclic group with a monomer containing an acid decomposable group which exhibits increased polarity by the action of acid, thereby obtaining the polymeric compound, provided that the polymeric compound comprises no structural unit derived from a monomer that generates acid upon exposure, wherein the copolymerizing is conducted in the presence of 0.001 to 1.0 mol % of a basic compound, based on the monomer containing an —SO— containing cyclic group.

Find Patent Forward Citations

Shiono, Daiju. (2015). Method of forming polymeric compound, resist composition and method of forming resist pattern (U.S. Patent No. 9023580). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9023580

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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