The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2015
Filed:
Sep. 26, 2013
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Kenichi Oyama, Nirasaki, JP;
Hidetami Yaegashi, Tokyo, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01L 21/308 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/306 (2013.01); H01L 21/3086 (2013.01); B81C 1/00031 (2013.01); B81C 2201/0149 (2013.01);
Abstract
A pattern forming method includes forming a pattern forming material film on a substrate as an etching target film, the pattern forming material film having an exposing section that has porosity upon exposure and a non-exposing section, patterning and exposing the pattern forming material film for the exposing section to have the porosity, selectively infiltrating a filling material into voids of the exposing section to reinforce the exposing section, and removing the non-exposing section of the pattern forming material film by dry etching to form a predetermined pattern.