The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2015

Filed:

Aug. 03, 2007
Applicants:

Erh-kun Lai, Longjing Shiang, TW;

Chiahua Ho, Kaoshing, TW;

Kuang Yeu Hsieh, Jhubei, TW;

Inventors:

Erh-Kun Lai, Longjing Shiang, TW;

ChiaHua Ho, Kaoshing, TW;

Kuang Yeu Hsieh, Jhubei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 47/00 (2006.01); H01L 45/00 (2006.01);
U.S. Cl.
CPC ...
H01L 45/16 (2013.01); H01L 45/06 (2013.01); H01L 45/1233 (2013.01); H01L 45/1273 (2013.01); H01L 45/144 (2013.01);
Abstract

A memory cell device, of the type that includes a memory material switchable between electrical property states by application of energy, includes first and second electrodes, a plug of memory material (such as phase change material) which is in electrical contact with the second electrode, and an electrically conductive film which is supported by a dielectric form and which is in electrical contact with the first electrode and with the memory material plug. The dielectric form is wider near the first electrode, and is narrower near the phase change plug. The area of contact of the conductive film with the phase change plug is defined in part by the geometry of the dielectric form over which the conductive film is formed. Also, methods for making the device include steps of constructing a dielectric form over a first electrode, and forming a conductive film over the dielectric form.


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