The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Mar. 04, 2014
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Daichi Takaki, Kawasaki, JP;
Yoshiyuki Utsumi, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Abstract
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) shown below. In the formula, Wrepresents a group which is formed by polymerization reaction of a group containing a polymerizable group; Yand Yeach independently represents a divalent linking group; Yrepresents a carbonyl group or an alkylene group; Rand Reach independently represents a fluorine atom or a fluorinated alkyl group; Mrepresents an organic cation having a valency of m; and m represents an integer of 1 or more.