The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2015

Filed:

Jun. 16, 2011
Applicants:

Rajwant S. Sidhu, Brea, CA (US);

Ruben A. Zepeda, Yorba Linda, CA (US);

Carlos A. Lopez, San Dimas, CA (US);

Inventors:

Rajwant S. Sidhu, Brea, CA (US);

Ruben A. Zepeda, Yorba Linda, CA (US);

Carlos A. Lopez, San Dimas, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 5/02 (2006.01); H05K 3/00 (2006.01); C25D 5/48 (2006.01); C23C 18/16 (2006.01); C25D 5/10 (2006.01); C25D 5/12 (2006.01); H05K 3/24 (2006.01); H05K 3/10 (2006.01);
U.S. Cl.
CPC ...
C25D 5/48 (2013.01); C23C 18/1653 (2013.01); C25D 5/022 (2013.01); C25D 5/10 (2013.01); C25D 5/12 (2013.01); H05K 3/108 (2013.01); H05K 3/244 (2013.01);
Abstract

Systems and methods for reducing overhang on electroplated surfaces of printed circuit boards are described. One such method includes applying a first resist layer on a substrate having a first copper layer, applying a first image to the first resist layer, developing the first resist layer in accordance with the first image, applying a second copper layer on the first copper layer, electroplating a first metallic layer on the second copper layer, removing the first resist layer, etching a portion of the first copper layer, removing the first metallic layer, depositing a third copper layer on a surface of the assembly, applying a second resist layer on the third copper layer, applying a second image to the second resist layer, developing the second resist layer in accordance with the second image, electroplating a preselected metal layer on the third copper layer, removing the second resist layer, and etching a portion of the third copper layer.


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