The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2015

Filed:

Jun. 29, 2007
Applicants:

Anthonius Martinus Cornelis Petrus DE Jong, Pijnacker, NL;

Hans Jansen, Eindhoven, NL;

Marco Koert Stavenga, Eindhoven, NL;

Peter Franciscus Wanten, Mierlo, NL;

Bauke Jansen, Deurne, NL;

Johannes Wilhelmus Jacobus Leonardus Cuijpers, Roermond, NL;

Raymond Gerardus Marius Beeren, Dalhem, BE;

Kornelis Tijmen Hoekerd, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); B08B 3/12 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70925 (2013.01); B08B 3/12 (2013.01); G03F 7/70341 (2013.01);
Abstract

An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.


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