The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2015
Filed:
Aug. 31, 2012
Applicants:
Xinyu Gu, Lake Jackson, TX (US);
Shih-wei Chang, Natick, MA (US);
Rahul Sharma, Lake Jackson, TX (US);
Valeriy Ginzburg, Midland, MI (US);
Phillip Hustad, Manvel, TX (US);
Jeffrey Weinhold, Lake Jackson, TX (US);
Peter Trefonas, Medway, MA (US);
Inventors:
Xinyu Gu, Lake Jackson, TX (US);
Shih-Wei Chang, Natick, MA (US);
Rahul Sharma, Lake Jackson, TX (US);
Valeriy Ginzburg, Midland, MI (US);
Phillip Hustad, Manvel, TX (US);
Jeffrey Weinhold, Lake Jackson, TX (US);
Peter Trefonas, Medway, MA (US);
Assignees:
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Dow Global Technologies LLC, Midland, MI (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08K 5/01 (2006.01); C03C 15/00 (2006.01); C08K 5/357 (2006.01); C08K 5/04 (2006.01); C09D 153/00 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
C09D 153/00 (2013.01); G03F 7/00 (2013.01);
Abstract
A copolymer composition and a method of processing a substrate to form line space features thereon are provided.