The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2015
Filed:
Jul. 10, 2012
Alexius Otto Looije, Naaldwijk, NL;
Michel Pieter Dansberg, Berkel en Rodenrijs, NL;
Marcel Nicolaas Jacobus Van Kervinck, The Hague, NL;
Guido DE Boer, Leerdam, NL;
Alexius Otto Looije, Naaldwijk, NL;
Michel Pieter Dansberg, Berkel en Rodenrijs, NL;
Marcel Nicolaas Jacobus Van Kervinck, The Hague, NL;
Guido De Boer, Leerdam, NL;
Mapper Lighography IP B.V., Delft, NL;
Abstract
The invention relates to a lithography system for patterning a target, said system comprising a feedback control system comprising an actuator for displacing the target, a measurement system for measuring a position of said target, and a control unit adapted for controlling the actuator based on the position measured by the measurement system, said feedback control system having a first latency being a maximum latency between measuring and controlling the actuator based on said measuring, a storage system for storing the measured positions, comprising a receive buffer and a storage unit with a second latency being an average latency between receiving measured positions in the receive buffer and storing said measured positions in the storage unit, wherein the first latency is at least an order of magnitude smaller than the second latency, the feedback control system comprising a unidirectional connection for transmitting said measured positions to the storage system.