The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2015
Filed:
Mar. 10, 2014
Applicant:
Carl Zeiss Microscopy Gmbh, Jena, DE;
Inventors:
Heinz Wanzenboeck, Vienna, AT;
Wolfram Buehler, Hermaringen, DE;
Holger Doemer, Bopfingen, DE;
Carl Kuebler, Aalen, DE;
Daniel Fischer, Dresden, DE;
Gottfried Hochleitner, Vienna, AT;
Emmerich Bertagnolli, Vienna, AT;
Assignee:
Carl Zeiss Microscopy GmbH, , DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 1/04 (2006.01); G21K 5/08 (2006.01); C23C 16/48 (2006.01); G01N 1/28 (2006.01); H01J 37/26 (2006.01); H01J 37/305 (2006.01);
U.S. Cl.
CPC ...
G01N 1/28 (2013.01); G01N 1/286 (2013.01); H01J 37/26 (2013.01); H01J 37/3056 (2013.01); H01J 37/261 (2013.01); H01J 2237/31745 (2013.01); H01J 2237/31749 (2013.01);
Abstract
A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.