The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2015
Filed:
May. 30, 2013
Rigaku Corporation, Akishima-shi, Tokyo, JP;
Kazuki Ito, Akishima, JP;
Yoshinori Ueji, Akishima, JP;
Koichi Kajiyoshi, Ome, JP;
Kunio Nishi, Hachiouji, JP;
Rigaku Corporation, Tokyo, JP;
Abstract
An X-ray analysis apparatus converts an X-ray intensity distribution of discrete data determined for each pixel, from a first plane where the distribution is known into a second plane where the distribution is not known. The X-ray analysis apparatus projects onto the second plane, a grid point which specifies a pixel on the first plane and an intermediate point between the grid points, as nodes, calculates an area of a region where a polygon expressing a projected pixel specified by the projected nodes overlaps with each pixel on the second plane, to thereby calculate an occupancy ratio of the polygon expressing the projected pixel to each pixel on the second plane and distributes X-ray intensity in the pixel on the first plane to the pixel on the second plane based on the occupancy ratio, to thereby convert the X-ray intensity distribution.