The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2015
Filed:
Feb. 27, 2012
Tsuyoshi Chiba, Tokyo, JP;
Hiroshi Fujita, Tokyo, JP;
Yuki Aritsuka, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
The object of the invention is to provide a mold that is capable of high-precision, stable patterning, and improved in terms of handleability as well, and a manufacturing method thereof. The mold of the invention has a pattern-formation surface defined by one surface, wherein the pattern-formation layer has a projection-and-depression structure area for patterning, and a base surface defined by another surface. At least the pattern-formation layer and the base surface each comprise a polydimethylsiloxane layer. Given a low-molecular-weight siloxane of a cyclic structure represented by [—Si(CH)O—]where k is an integer of 3 to 20 inclusive, the polydimethylsiloxane layer positioned on the pattern-formation layer comprises a high-content polydimethylsiloxane layer containing the low-molecular-weight siloxane in a larger amount, and the polydimethylsiloxane layer positioned on the base surface comprises a low-content polydimethylsiloxane layer containing the low-molecular-weight siloxane in a smaller amount.