The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2015
Filed:
Nov. 04, 2010
Ronda K. Nixon, San Francisco, CA (US);
Iqbal A. Shareef, Fremont, CA (US);
Mark I. Wagner, Austin, TX (US);
Robert Mcandrew, Austin, TX (US);
Tony Ray Kroeker, Georgetown, TX (US);
Ronda K. Nixon, San Francisco, CA (US);
Iqbal A. Shareef, Fremont, CA (US);
Mark I. Wagner, Austin, TX (US);
Robert McAndrew, Austin, TX (US);
Tony Ray Kroeker, Georgetown, TX (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A processing chamber for post-wet-etch removing of drying fluid (DF) is disclosed. The chamber includes a chamber wall surrounding a processing volume and a plurality of nozzles disposed annularly about the processing volume and arranged into a set of nozzle rows that includes at least one nozzle row. The chamber also includes a plenum and a set of manifolds coupled to the plurality of nozzles to deliver the supercritical COto the plurality of nozzles. Each nozzle has a nozzle outlet directed toward an interior portion of the processing volume and the nozzles are configured to flow the supercritical COtoward the substrates in a manner that minimizes recirculation loops and vortices.