The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2015

Filed:

Sep. 06, 2011
Applicants:

Eiki Endo, Miyagi, JP;

Tatsuya Ogi, Miyagi, JP;

Inventors:

Eiki Endo, Miyagi, JP;

Tatsuya Ogi, Miyagi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67748 (2013.01); H01L 21/67126 (2013.01); H01L 21/67742 (2013.01);
Abstract

There is provided a substrate transfer method capable of preventing fine particles from adhering to a wafer. A substrate processing systemincludes process modulestoeach having therein an inner space S; a transfer module, having an inner space S, connected to the process modulesto; and opening/closing gate valveseach partitioning the inner space Sand the inner space S. The transfer moduleincludes in the inner space Sa transfer arm devicefor holding a wafer W and for loading/unloading the wafer W into/from the process modulesto. The transfer arm deviceholds the wafer W at a retreated position deviated from a facing position facing the gate valveduring an opening motion of the gate valve


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