The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Apr. 23, 2012
Wendell G. Boyd, Jr., Morgan Hill, CA (US);
Joseph F. Sommers, San Jose, CA (US);
William M. LU, Sunnyvale, CA (US);
Rajan Balesan, Fremont, CA (US);
Wendell G. Boyd, Jr., Morgan Hill, CA (US);
Joseph F. Sommers, San Jose, CA (US);
William M. Lu, Sunnyvale, CA (US);
Rajan Balesan, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present invention generally relates to a refurbished electrostatic chuck and a method of refurbishing a used electrostatic chuck. Initially, a predetermined amount of dielectric material is removed from the used electrostatic chuck to leave a base surface. Then, the base surface is roughened to enhance the adherence of new dielectric material thereto. The new dielectric material is then sprayed onto the roughened surface. A mask is then placed over the new dielectric material to aid in the formation of mesas upon which a substrate will sit during processing. A portion of the new dielectric layer is then removed to form new mesas. After removing the mask, edges of the mesas may be smoothed and the refurbished electrostatic chuck is ready to return to service after cleaning.