The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2015
Filed:
Oct. 12, 2009
Johan Maria Van Boxmeer, Sint Oedenrode, NL;
Nicolass Antonius Allegondus Johannes Van Asten, Breda, NL;
Arnold Sinke, Veldhoven, NL;
Marnix Aldert Tas, Eindhoven, NL;
Johannes Cornelis Maria Timmermans, Eersel, NL;
Jascha Van Pommeren, Groningen, NL;
Johan Maria Van Boxmeer, Sint Oedenrode, NL;
Nicolass Antonius Allegondus Johannes Van Asten, Breda, NL;
Arnold Sinke, Veldhoven, NL;
Marnix Aldert Tas, Eindhoven, NL;
Johannes Cornelis Maria Timmermans, Eersel, NL;
Jascha Van Pommeren, Groningen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A scatterometer for measuring a property of a substrate includes a focus sensing arrangement including an arrangement () that directs a first beam of radiation onto a focusing arrangement, to be detected by a focus sensor arrangement (). A focus controller () provides control signals representative of the relative positions of the focusing arrangement () and the substrate (W), which are required to focus the first beam of radiation on the substrate. An actuator arrangement adjusts the position of the focusing arrangement dependent on the control signals. An irradiation arrangement directs a second beam of radiation onto the substrate using the focusing arrangement, a measurement detector () detecting the second radiation beam after reflection from the substrate. A focus offset arrangement adjusts the focus produced by the focusing arrangement to compensate for an offset between the focusing of the first beam of radiation and the second beam of radiation.