The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2015
Filed:
Apr. 08, 2010
Applicants:
Nina Vladimirovna Dziomkina, Eindhoven, NL;
Olga Vladimirovna Elisseeva, Delft, NL;
Inventors:
Nina Vladimirovna Dziomkina, Eindhoven, NL;
Olga Vladimirovna Elisseeva, Delft, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03B 27/58 (2006.01);
U.S. Cl.
CPC ...
G03B 27/58 (2013.01); G03F 7/70341 (2013.01); G03F 7/70716 (2013.01);
Abstract
An immersion lithographic apparatus has a surface that in use is contacted by the immersion liquid and the surface has a surface roughness Rthat is less than or equal to 0.2 μm. Immersion liquid on the surface may have a contact angle of 60° or greater. The surface may be able to maintain its properties so that immersion liquid on the surface may have the contact angle for a prolonged period of immersion in the immersion liquid.