The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2015
Filed:
Jun. 27, 2013
Applicant:
Micron Technology, Inc., Boise, ID (US);
Inventors:
Dan B. Millward, Boise, ID (US);
Donald L. Westmoreland, Garden City, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/02 (2006.01); H01L 29/06 (2006.01); B81C 1/00 (2006.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
H01L 29/0657 (2013.01); B81C 1/00031 (2013.01); B82Y 30/00 (2013.01); H01L 29/06 (2013.01); B81C 2201/0149 (2013.01); B81C 2201/0198 (2013.01); Y10S 977/888 (2013.01); Y10S 977/90 (2013.01); Y10S 977/895 (2013.01); Y10S 438/947 (2013.01);
Abstract
Methods for fabricating sublithographic, nanoscale microstructures in line arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. Semiconductor structures may include self-assembled block copolymer materials in the form of lines of half-cylinders of a minority block matrix of a majority block of the block copolymer. The lines of half-cylinders may be within trenches in the semiconductor structures.