The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2015
Filed:
Sep. 30, 2009
Applicants:
Kazuaki Kozasa, Omura, JP;
Tomonori Kawasaki, Omura, JP;
Takahisa Sugiman, Omura, JP;
Hironori Nishimura, Omura, JP;
Inventors:
Kazuaki Kozasa, Omura, JP;
Tomonori Kawasaki, Omura, JP;
Takahisa Sugiman, Omura, JP;
Hironori Nishimura, Omura, JP;
Assignee:
Sumco Techxiv Corporation, Nagasaki, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02046 (2013.01); H01L 21/02052 (2013.01); H01L 21/02054 (2013.01);
Abstract
A silicon wafer surface other than a defect is oxidized by ozone to form a silicon oxide film. A hydrofluoric acid is sprayed and subsequently a cleaning gas is sprayed onto the surface of the silicon wafer.
Kozasa, Kazuaki. (2015). Method of cleaning semiconductor wafer and semiconductor wafer (U.S. Patent No. 8992791). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8992791
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile