The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2015
Filed:
Aug. 08, 2008
Rongjun Wang, Cupertino, CA (US);
Xianmin Tang, San Jose, CA (US);
Zhendong Liu, San Jose, CA (US);
Tza-jing Gung, San Jose, CA (US);
Maurice E. Ewert, San Jose, CA (US);
Rongjun Wang, Cupertino, CA (US);
Xianmin Tang, San Jose, CA (US);
Zhendong Liu, San Jose, CA (US);
Tza-Jing Gung, San Jose, CA (US);
Maurice E. Ewert, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
In a plasma-enhanced physical vapor deposition reactor, uniformity of radial distribution of the deposition rate across the workpiece is enhanced by applying both RF and D.C. power to the target and adjusting the power levels of the RF and D.C. power independently. Further optimization is obtained by adjusting the height of the magnet above the target, adjusting the radius of the orbital motion of the magnet above the target and providing an angle edge surface of the target.