The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2015
Filed:
Feb. 29, 2012
Adauto Diaz, Saratoga, CA (US);
Andrew Nguyen, San Jose, CA (US);
Benjamin Schwarz, San Jose, CA (US);
Eu Jin Lim, Sunnyvale, CA (US);
Jared Ahmad Lee, Santa Clara, CA (US);
James P. Cruse, Soquel, CA (US);
LI Zhang, Mountain View, CA (US);
Scott M. Williams, Sunnyvale, CA (US);
Xiaoliang Zhuang, Santa Clara, CA (US);
Zhuang LI, San Jose, CA (US);
Adauto Diaz, Saratoga, CA (US);
Andrew Nguyen, San Jose, CA (US);
Benjamin Schwarz, San Jose, CA (US);
Eu Jin Lim, Sunnyvale, CA (US);
Jared Ahmad Lee, Santa Clara, CA (US);
James P. Cruse, Soquel, CA (US);
Li Zhang, Mountain View, CA (US);
Scott M. Williams, Sunnyvale, CA (US);
Xiaoliang Zhuang, Santa Clara, CA (US);
Zhuang Li, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods for removing halogen-containing residues from a substrate are provided. By combining the heat-up and plasma abatement steps, the manufacturing throughput can be improved. Further, by appropriately controlling the pressure in the abatement chamber, the removal efficiency can be improved as well.