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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8987386 B1

PDFFull Text
Date of Patent:
Mar. 24, 2015

Filed:

Jun. 08, 2012

Method of producing polymeric compound, resist composition, and method of forming resist pattern

Applicants:

Yoshiyuki Utsumi, Kawasaki, JP;

Takahiro Dazai, Kawasaki, JP;

Masatoshi Arai, Kawasaki, JP;

Takaaki Kaiho, Kawasaki, JP;

Inventors:

Yoshiyuki Utsumi, Kawasaki, JP;

Takahiro Dazai, Kawasaki, JP;

Masatoshi Arai, Kawasaki, JP;

Takaaki Kaiho, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

Cynthia Hamilton

Int. Cl.
CPC ...
C08F 228/02 (2006.01); C08F 228/06 (2006.01); C08F 8/34 (2006.01); C08F 20/36 (2006.01); C08F 20/38 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01); C08F 220/34 (2006.01); C08F 220/38 (2006.01); C08F 8/00 (2006.01); G03F 7/20 (2006.01); G03F 7/004 (2006.01); G03F 7/11 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
C08F 8/34 (2013.01); C08F 228/02 (2013.01); C08F 228/06 (2013.01); G03F 7/20 (2013.01); C08F 220/18 (2013.01); C08F 220/28 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01); Y10S 522/904 (2013.01);
Abstract

A method of producing a polymeric compound containing a structural unit that decomposes upon exposure to generate an acid, the method including: synthesizing a precursor polymer by polymerizing a water-soluble monomer having an anionic group, washing the precursor polymer with water, and subsequently subjecting the precursor polymer to a salt exchange with an organic cation. Also, a polymeric compound produced using the method of producing a polymeric compound, and a method of forming a resist pattern using the resist composition.

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