The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2015

Filed:

Nov. 18, 2012
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Joy Cheng, San Jose, CA (US);

Daniel J. Coady, San Jose, CA (US);

Matthew E. Colburn, Schenectady, NY (US);

Blake W. Davis, Hollister, CA (US);

James L. Hedrick, Pleasanton, CA (US);

Steven J. Holmes, Guilderland, NY (US);

Hareem T. Maune, San Jose, CA (US);

Alshakim Nelson, Freemont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81C 1/00 (2006.01); B29B 9/16 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
B29B 9/16 (2013.01); B82Y 40/00 (2013.01); B81C 1/00214 (2013.01);
Abstract

A method of preparing particles comprises forming by optical lithography a topographic template layer disposed on a surface of a substrate, which is suitable for spin casting. The template layer comprises a non-crosslinked template polymer having a pattern of independent wells therein for molding independent particles. Spin casting a particle-forming composition onto the template layer forms a composite layer comprising the template polymer and the particles disposed in the wells. The composite layer is removed from the substrate using a stripping agent that dissolves the template polymer without dissolving the particles. The particles are then isolated.


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