The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Feb. 01, 2013
Applicant:
Novellus Systems, Inc., Fremont, CA (US);
Inventors:
Mark K. Tan, San Jose, CA (US);
Nicholas M. Kopec, Sunnyvale, CA (US);
Richard M. Blank, San Jose, CA (US);
Assignee:
Novellus Systems, Inc., Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B25J 19/00 (2006.01); F16F 7/10 (2006.01); B25J 18/00 (2006.01); B25J 15/00 (2006.01); F16F 15/10 (2006.01); B25J 11/00 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
F16F 7/10 (2013.01); B25J 18/00 (2013.01); B25J 15/00 (2013.01); F16F 15/10 (2013.01); B25J 11/0095 (2013.01); H01L 21/67196 (2013.01); H01L 21/67201 (2013.01); H01L 21/68707 (2013.01); Y10S 901/30 (2013.01);
Abstract
A calibrated mass damper for use with end effectors for semiconductor wafer handling robots is described. The calibrated mass damper reduces vibrational response in an end effector carrying a semiconductor wafer without requiring modification of the end effector structure.