The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2015

Filed:

Sep. 08, 2009
Applicants:

Chung Ho Huang, San Jose, CA (US);

Vijayakumar C. Venugopal, Berkeley, CA (US);

Connie Lam, Los Altos, CA (US);

Dragan Podlesnik, Palo Alto, CA (US);

Inventors:

Chung Ho Huang, San Jose, CA (US);

Vijayakumar C. Venugopal, Berkeley, CA (US);

Connie Lam, Los Altos, CA (US);

Dragan Podlesnik, Palo Alto, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G05B 11/01 (2006.01); G06F 19/00 (2011.01); G06F 9/50 (2006.01); G05B 19/418 (2006.01); G06F 11/20 (2006.01);
U.S. Cl.
CPC ...
G06F 9/5027 (2013.01); G05B 19/4184 (2013.01); G05B 2219/31202 (2013.01); G05B 2219/31293 (2013.01); G05B 2219/31318 (2013.01); G05B 2219/31481 (2013.01); G05B 2219/32209 (2013.01); G05B 2219/45031 (2013.01); G06F 11/2035 (2013.01); G06F 11/2043 (2013.01);
Abstract

A process-level troubleshooting architecture (PLTA) configured to facilitate substrate processing in a plasma processing system is provided. The architecture includes a process module controller. The architecture also includes a plurality of sensors, wherein each sensor of the plurality of sensors communicates with the process module controller to collect sensed data about one or more process parameters. The architecture further includes a process-module-level analysis server, wherein the process-module-level analysis server communicates directly with the plurality of sensors and the process module controller. The process-module-level analysis server is configured for receiving data, wherein the data include at least one of the sensed data from the plurality of sensors and process module and chamber data from the process module controller. The process-module-level analysis server is also configured for analyzing the data and sending interdiction data directly to the process module controller when a problem is identified during the substrate processing.


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