The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2015

Filed:

Aug. 23, 2013
Applicant:

United Microelectronics Corp., Hsinchu, TW;

Inventors:

Chang-Tzu Wang, Taoyuan County, TW;

Pei-Shan Tseng, Hsinchu, TW;

Tien-Hao Tang, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/735 (2006.01); H01L 29/73 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/73 (2013.01); H01L 29/66234 (2013.01); H01L 29/6625 (2013.01); H01L 29/735 (2013.01);
Abstract

Provided is a lateral BJT including a substrate, a well region, an area, at least one lightly doped region, a first doped region, and a second doped region. The substrate is of a first conductivity type. The well region is of a second conductivity type and is in the substrate. The area is in the well region. The at least one lightly doped region is in the well region below the area. The first doped region and the second doped region are of the first conductivity type and are in the well region on both sides of the area. The first doped region is connected to a cathode. The second doped region is connected to an anode, wherein the doping concentration of the at least one lightly doped region is lower than that of each of the first doped region, the second doped region, and the well region.


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