The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Jul. 14, 2011
Applicants:
Hiroshi Matsunaga, Tokyo, JP;
Masaru Ohto, Tokyo, JP;
Inventors:
Hiroshi Matsunaga, Tokyo, JP;
Masaru Ohto, Tokyo, JP;
Assignee:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/32 (2006.01); H01L 21/02 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0206 (2013.01); C11D 7/3209 (2013.01); C11D 7/3281 (2013.01); B81C 1/00825 (2013.01);
Abstract
There are provided a processing liquid for suppressing pattern collapse of a microstructure which includes at least one compound selected from the group consisting of an imidazolium halide containing an alkyl group having 12, 14 or 16 carbon atoms, a pyridinium halide containing an alkyl group having 14 or 16 carbon atoms and an ammonium halide containing an alkyl group having 16 or 18 carbon atoms, and water; and a method for producing a microstructure formed of silicon oxide using the processing liquid.