The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Oct. 19, 2012
Applicant:
Intermolecular, Inc., San Jose, CA (US);
Inventors:
Sunil Shanker, Santa Clara, CA (US);
Tony P. Chiang, Campbell, CA (US);
Assignee:
Intermolecular, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01J 37/32 (2006.01); C23C 16/04 (2006.01); C23C 16/455 (2006.01); C23C 16/509 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32366 (2013.01); C23C 16/04 (2013.01); C23C 16/45536 (2013.01); C23C 16/45551 (2013.01); C23C 16/45565 (2013.01); C23C 16/45574 (2013.01); C23C 16/5096 (2013.01); H01J 37/32357 (2013.01);
Abstract
Combinatorial plasma enhanced deposition techniques are described, including designating multiple regions of a substrate, providing a precursor to at least a first region of the multiple regions, and providing a plasma to the first region to deposit a first material on the first region formed using the first precursor, wherein the first material is different from a second material formed on a second region of the substrate.