The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Aug. 20, 2014
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Edward P. Maciejewski, Wappingers Falls, NY (US);
Dustin Kenneth Slisher, Wappingers Falls, NY (US);
Stefan Zollner, Las Cruces, NM (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 23/525 (2006.01); H01L 21/3065 (2006.01); H01L 21/3205 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 23/5256 (2013.01); H01L 21/3065 (2013.01); H01L 21/32053 (2013.01); H01L 21/31116 (2013.01);
Abstract
An improved eFuse and method of fabrication is disclosed. A cavity is formed in a substrate, which results in a polysilicon line having an increased depth in the area of the fuse, while having a reduced depth in areas outside of the fuse. The increased depth reduces the chance of the polysilicon line entering the fully silicided state. The cavity may be formed with a wet or dry etch.