The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2015
Filed:
Nov. 27, 2012
Applicant:
Intermolecular, Inc., San Jose, CA (US);
Inventors:
Richard R. Endo, San Carlos, CA (US);
Rajesh Kelekar, Los Altos, CA (US);
Assignee:
Intermolecular, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 11/11 (2006.01); B05C 11/115 (2006.01); B05D 1/00 (2006.01); B05D 1/32 (2006.01);
U.S. Cl.
CPC ...
B05D 1/005 (2013.01); B05D 1/32 (2013.01);
Abstract
A spin deposition apparatus includes a deposition mask configured to be arranged proximate a target substrate. The deposition mask includes at least one fluid reservoir offset from a rotational axis of the deposition mask and configured to hold fluid for dispersal on a portion of a surface of the target substrate.