The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
May. 23, 2012
Han-kwang Nienhuys, Utrecht, NL;
Franciscus Johannes Joseph Janssen, Geldrop, NL;
Sven Pekelder, Breugel, NL;
Roger Wilhelmus Antonius Henricus Schmitz, Helmond, NL;
Alexander Marinus Arnoldus Huijberts, Veghel, NL;
Paulus Albertus Maria Gasseling, Steensel, NL;
Han-Kwang Nienhuys, Utrecht, NL;
Franciscus Johannes Joseph Janssen, Geldrop, NL;
Sven Pekelder, Breugel, NL;
Roger Wilhelmus Antonius Henricus Schmitz, Helmond, NL;
Alexander Marinus Arnoldus Huijberts, Veghel, NL;
Paulus Albertus Maria Gasseling, Steensel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a substrate table constructed to hold a substrate, and a projection system configured to project a patterned radiation beam onto a target portion of the substrate. A surface of a component of the lithographic apparatus that is in a vacuum environment in use is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface.