The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2015

Filed:

Jan. 22, 2013
Applicant:

Carl Zeiss Microscopy Gmbh, Jena, DE;

Inventors:

Ulrike Zeile, Heidenheim, DE;

Matthias Knappich, Aalen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21G 1/00 (2006.01); F17D 1/04 (2006.01); H01J 37/02 (2006.01); H01J 37/305 (2006.01);
U.S. Cl.
CPC ...
F17D 1/04 (2013.01); H01J 37/02 (2013.01); H01J 37/3056 (2013.01); H01J 2237/006 (2013.01);
Abstract

A system for supplying a process gas to a processing location of a particle beam system is disclosed. The system for supplying the processing gas includes a gas reservoir, a gas conduit, a pipe located close to the processing location, a valve between the gas conduit and the pipe, and a controller configured to open and to close the valve to switch the system from a first mode of operation in which process gas is not supplied to the processing location to a second mode of operation in which process gas is supplied to the processing location. The controller can alternately open and close the valve in cycles. Each cycle can include a first duration in which the valve is open and a second duration in which the valve is closed. The ratio of the first duration to the second duration can be changed.


Find Patent Forward Citations

Loading…